2022•SID Symposium Digest of Technical PapersRequires access

P‐3.25: Synergistic effects between Optical Proximity Correction (OPC) and lithography process simulation in display backplane

Shantao Chen, Meng Zhao, Qiuhua Meng, Ming Liu, Lianjian Li, Zheng Liu, Brian Kao, Dawei Wang

Abstract

In this paper, lithographic simulation tools, including Optical Proximity Correction (OPC), have been applied in designing backplane layout of displays. That will lead to better resolution of lower feature size of the lithography process in display manufacturing with wider process window.

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Available abstract

Key concepts: Backplane, Optical proximity correction, Lithography, Process window, Process (computing), Photolithography, Computer science, Proximity effect (electron beam lithography)