Shape Evaluation of UV-PDMS Microstructures Made by Using Photolithography
Ten Sekiguchi, Ryo Ichige, Hidetaka Ueno, Takaaki Suzuki
Abstract
Ten Sekiguchi, Ryo Ichige, Hidetaka Ueno, Takaaki Suzuki
Abstract
We propose a microfabrication method for UV-PDMS (ultra violet-curable polydimethylsiloxane), which can be fabricated by photolithography due to its material properties. However, the accuracy of the UV-PDMS microstructures fabricated by photolithography is inferior to that of the conventional photoresists. To improve the microfabrication accuracy of UV-PDMS, we investigated the solvent used to remove unexposed areas of photo-patterned UV-PDMS with the aim of selecting an appropriate solvent for microfabrication of UV-PDMS. The effect of the difference in solvent on the microfabrication accuracy of UV-PDMS was quantitatively evaluated.
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We propose a microfabrication method for UV-PDMS (ultra violet-curable polydimethylsiloxane), which can be fabricated by photolithography due to its material properties. However, the accuracy of the UV-PDMS microstructures fabricated by photolithography is inferior to that of the conventional photoresists. To improve the microfabrication accuracy of UV-PDMS, we investigated the solvent used to remove unexposed areas of photo-patterned UV-PDMS with the aim of selecting an appropriate solvent for microfabrication of UV-PDMS. The effect of the difference in solvent on the microfabrication accuracy of UV-PDMS was quantitatively evaluated.
Key concepts: Microfabrication, Polydimethylsiloxane, Photolithography, Materials science, Lithography, Nanotechnology, Optoelectronics, Fabrication