2022•Unpublished venueRequires access
Swelling and dissolution kinetics of poly(4-hydroxystyrene) in alkaline aqueous solution studied by quartz crystal microbalance (QCM) method
Yuko Tsutsui Ito, Hitomi Betsumiya, Takahiro Kozawa, Kazuo Sakamoto, Makoto Muramatsu
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Abstract
The dissolution (including the formation of transient swelling layer) of a resist polymer is key to the realization of ultrafine patterning. However, the details of the dissolution of resist polymers remain unclarified. In this study, the swelling and dissolution kinetics of poly(4-hydroxystyrene) (PHS) film in pure water and alkaline aqueous solution were investigated. PHS is a typical backbone polymer (a dissolution agent) of chemically amplified resists. By changing the length of alkyl chains of amines, the swelling and dissolution kinetics of PHS were observed. Their dependences on the film thickness of PHS and the concentration of amines were discussed.