Dose uniformity of a compact beamline in routine operation with a storage ring "AURORA-2S"
S. Hirose, D. Amano, T. Miyatake, Xan Li, T. Hori
Abstract
S. Hirose, D. Amano, T. Miyatake, Xan Li, T. Hori
Abstract
In 1998, we developed a short beamline with high brightness for x-ray lithography. In 1999, the beamline which is installed in our Tanashi-plan has achieved a dose uniformity better than /spl plusmn/5 % with an exposure intensity over 60 mW/cm/sup 2/ using a synchrotron radiation (SR) beam from a storage ring "AURORA-2S (A2S)". In routine operation, the position of SR beam moves in a range of 0.15 mm in horizontal direction and 0.1 mm in vertical direction. The beam profile varies from round shape to oval shape with an operation parameter. In this paper, we describe the impact of both the beam profile and beam position stability on dose uniformity of the beamline.
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In 1998, we developed a short beamline with high brightness for x-ray lithography. In 1999, the beamline which is installed in our Tanashi-plan has achieved a dose uniformity better than /spl plusmn/5 % with an exposure intensity over 60 mW/cm/sup 2/ using a synchrotron radiation (SR) beam from a storage ring "AURORA-2S (A2S)". In routine operation, the position of SR beam moves in a range of 0.15 mm in horizontal direction and 0.1 mm in vertical direction. The beam profile varies from round shape to oval shape with an operation parameter. In this paper, we describe the impact of both the beam profile and beam position stability on dose uniformity of the beamline.
Key concepts: Beamline, Storage ring, Optics, Synchrotron radiation, Beam (structure), Synchrotron, Brightness, Physics