K. Yamazaki, H. Namatsu
Abstract
In this paper, electron beam lithography for nanodevice fabrication was studied. SEM micrographs of 30 nm thick HSQ resist are shown.
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In this paper, electron beam lithography for nanodevice fabrication was studied. SEM micrographs of 30 nm thick HSQ resist are shown.
Key concepts: Nanodevice, Electron-beam lithography, Resist, Fabrication, Lithography, Materials science, Stencil lithography, Optoelectronics