THE INTERDIFFUSION OF TANTALUM AND TUNGSTEN
I.A. Tregubov, L.N. Kuzina, O. V. Ivanov
Abstract
I.A. Tregubov, L.N. Kuzina, O. V. Ivanov
Abstract
To determine the coefficient of interdiffusion between tungsten and tantalum, ground specimens of tungsten and tantalum were held in a vacuum at 2000 degrees C for 48 hours. The diffusion coefficient of tantalum was found to depend on the tungsten content in the interface diffusion layer. The value of the diffusion coefficient of tantalum sharply decreased with increasing tungsten content from 10 to 50 wt. percent, and gradually increased with increasing tungsten content from 60 to 90 wt. percent. The interdiffusion coefficient had a minimum value at a tungsten content of 40-60 wt. percent.
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To determine the coefficient of interdiffusion between tungsten and tantalum, ground specimens of tungsten and tantalum were held in a vacuum at 2000 degrees C for 48 hours. The diffusion coefficient of tantalum was found to depend on the tungsten content in the interface diffusion layer. The value of the diffusion coefficient of tantalum sharply decreased with increasing tungsten content from 10 to 50 wt. percent, and gradually increased with increasing tungsten content from 60 to 90 wt. percent. The interdiffusion coefficient had a minimum value at a tungsten content of 40-60 wt. percent.
Key concepts: Tantalum, Tungsten, Diffusion, Materials science, Metallurgy, Analytical Chemistry (journal), Chemistry, Chromatography