Reevaluating the Cr Evaporation Characteristics of Ce/Co Coatings for Interconnect Applications
Mareddy Jayanth Reddy, Jan‐Erik Svensson, Jan Froitzheim
Abstract
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Mareddy Jayanth Reddy, Jan‐Erik Svensson, Jan Froitzheim
Abstract
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Cathode poisoning by chromium evaporation from the interconnects is one of the major degradation mechanisms in SOFC. Coatings have proved to be very effective in suppressing chromium evaporation on interconnects. The quantification of chromium evaporation is important for determining the chromium consumption in the interconnect and predicting the lifetime of the interconnect. Chromium evaporation of uncoated and Ce/Co coated Crofer 22 APU is reevaluated at 800°C. The chromium evaporation of Ce/Co coatings on steel sheets and precut steels is studied. Coupons cut from Ce/Co coated sheets have uncoated edges, which influence the chromium evaporation measurements. The true chromium evaporation of the coated interconnects is evaluated. The PVD Ce/Co coatings on Crofer 22 APU reduce the chromium evaporation by at least 60 times compared to the uncoated at 800°C.
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Cathode poisoning by chromium evaporation from the interconnects is one of the major degradation mechanisms in SOFC. Coatings have proved to be very effective in suppressing chromium evaporation on interconnects. The quantification of chromium evaporation is important for determining the chromium consumption in the interconnect and predicting the lifetime of the interconnect. Chromium evaporation of uncoated and Ce/Co coated Crofer 22 APU is reevaluated at 800°C. The chromium evaporation of Ce/Co coatings on steel sheets and precut steels is studied. Coupons cut from Ce/Co coated sheets have uncoated edges, which influence the chromium evaporation measurements. The true chromium evaporation of the coated interconnects is evaluated. The PVD Ce/Co coatings on Crofer 22 APU reduce the chromium evaporation by at least 60 times compared to the uncoated at 800°C.
Key concepts: Chromium, Evaporation, Materials science, Cathode, Metallurgy, Interconnection, Chemistry, Physics