Ultra-Low Switching Loss Triple-Gate controlled IGBT
Tatsunori Sakano, Kazuto Takao, Yoko Iwakaji, Hiroko Itokazu, Tomoko Matsudai
Abstract
Tatsunori Sakano, Kazuto Takao, Yoko Iwakaji, Hiroko Itokazu, Tomoko Matsudai
Abstract
A triple-gate 1.2-kV Si-insulated-gate bipolar transistor (TG-IGBT) is proposed in order to drastically improve both turn-on loss (Eon) and turn-off loss (Eoff) by using a novel gate drive control technique. In this work, we fabricated a 1.2-kV TG-IGBT that achieved 50% and 28% Eon and Eoff reduction, respectively, compared with a conventional single-gate IGBT. This result indicates that it is possible to overcome the limitations of Si by optimizing the device structure and gate drive control.
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A triple-gate 1.2-kV Si-insulated-gate bipolar transistor (TG-IGBT) is proposed in order to drastically improve both turn-on loss (Eon) and turn-off loss (Eoff) by using a novel gate drive control technique. In this work, we fabricated a 1.2-kV TG-IGBT that achieved 50% and 28% Eon and Eoff reduction, respectively, compared with a conventional single-gate IGBT. This result indicates that it is possible to overcome the limitations of Si by optimizing the device structure and gate drive control.
Key concepts: Insulated-gate bipolar transistor, Gate driver, Current injection technique, Gate turn-off thyristor, Materials science, Logic gate, Transistor, Electrical engineering