2021Unpublished venueRequires access

Ultra-Low Switching Loss Triple-Gate controlled IGBT

Tatsunori Sakano, Kazuto Takao, Yoko Iwakaji, Hiroko Itokazu, Tomoko Matsudai

Open publisher page 13 citations

Abstract

A triple-gate 1.2-kV Si-insulated-gate bipolar transistor (TG-IGBT) is proposed in order to drastically improve both turn-on loss (Eon) and turn-off loss (Eoff) by using a novel gate drive control technique. In this work, we fabricated a 1.2-kV TG-IGBT that achieved 50% and 28% Eon and Eoff reduction, respectively, compared with a conventional single-gate IGBT. This result indicates that it is possible to overcome the limitations of Si by optimizing the device structure and gate drive control.

About this research paper

What this paper is about

A triple-gate 1.2-kV Si-insulated-gate bipolar transistor (TG-IGBT) is proposed in order to drastically improve both turn-on loss (Eon) and turn-off loss (Eoff) by using a novel gate drive control technique. In this work, we fabricated a 1.2-kV TG-IGBT that achieved 50% and 28% Eon and Eoff reduction, respectively, compared with a conventional single-gate IGBT. This result indicates that it is possible to overcome the limitations of Si by optimizing the device structure and gate drive control.

Why it matters

OpenAlex reports 13 citations for this work. Citation counts describe recorded attention and do not establish research quality.

Key contribution

A contribution statement is not available in the OpenAlex record.

Method / approach

Method details are not available in the OpenAlex metadata.

Main findings

Findings are not separately available in the OpenAlex metadata.

Limitations

Limitations are not available in the OpenAlex metadata.

Applications

Application details are not available in the OpenAlex metadata.

Available abstract

A triple-gate 1.2-kV Si-insulated-gate bipolar transistor (TG-IGBT) is proposed in order to drastically improve both turn-on loss (Eon) and turn-off loss (Eoff) by using a novel gate drive control technique. In this work, we fabricated a 1.2-kV TG-IGBT that achieved 50% and 28% Eon and Eoff reduction, respectively, compared with a conventional single-gate IGBT. This result indicates that it is possible to overcome the limitations of Si by optimizing the device structure and gate drive control.

Key concepts: Insulated-gate bipolar transistor, Gate driver, Current injection technique, Gate turn-off thyristor, Materials science, Logic gate, Transistor, Electrical engineering

Related papers

Back to paper searchBrowse research topicsOriginal source
Ultra-Low Switching Loss Triple-Gate controlled IGBT — Research Paper | ScholarLens