2021Nano- i Mikrosistemnaya TehnikaRequires access

Research and Development of MEMS Accelerometer's Sensor

Timoshenkov S.P., Anchutin S.A., Zarjankin N.M., Kalugin V.V., Kochurina E.S., Timoshenkov A.S., Boev L.R.

Open publisher page 3 citations

Abstract

Currently, MEMS accelerometers are one of the most promising areas in the inertial sensor industry. The design and study of MEMS accelerometers structures is associated with solving problems of mathematical physics. Also, a very important task is to comply with the technological route, including carrying out such operations as deep etching of silicon. This article describes the modeling of the developed geometric model of the sensitive element MEMS accelerometer. The calculations were carried out, which showed that the developed structure is efficient. As a result of the study of the Bosch process using methods for planning multifactor experiments, the modes of deep etching of silicon were optimized. Prototypes of sensitive element MEMS accelerometers have been produced.

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What this paper is about

Currently, MEMS accelerometers are one of the most promising areas in the inertial sensor industry. The design and study of MEMS accelerometers structures is associated with solving problems of mathematical physics. Also, a very important task is to comply with the technological route, including carrying out such operations as deep etching of silicon. This article describes the modeling of the developed geometric model of the sensitive element MEMS accelerometer. The calculations were carried out, which showed that the developed structure is efficient. As a result of the study of the Bosch process using methods for planning multifactor experiments, the modes of deep etching of silicon were optimized. Prototypes of sensitive element MEMS accelerometers have been produced.

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Available abstract

Currently, MEMS accelerometers are one of the most promising areas in the inertial sensor industry. The design and study of MEMS accelerometers structures is associated with solving problems of mathematical physics. Also, a very important task is to comply with the technological route, including carrying out such operations as deep etching of silicon. This article describes the modeling of the developed geometric model of the sensitive element MEMS accelerometer. The calculations were carried out, which showed that the developed structure is efficient. As a result of the study of the Bosch process using methods for planning multifactor experiments, the modes of deep etching of silicon were optimized. Prototypes of sensitive element MEMS accelerometers have been produced.

Key concepts: Accelerometer, Microelectromechanical systems, Etching (microfabrication), Process (computing), Finite element method, Computer science, Inertial frame of reference, Electronic engineering

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