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Deposition and properties of highly c-oriented of InN films on sapphire substrates with ECR-plasma-enhanced MOCVD

Qin Qin, Fuwen, Zhang Zhang, Dong, Bai, Yizhen, Jü, Zhenhe, Li, Shuang-Mei, Yucai, Pang, Jiaqi, Bian, Jiming

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Key concepts: Metalorganic vapour phase epitaxy, Sapphire, Materials science, Chemical vapor deposition, Deposition (geology), Plasma, Optoelectronics, Nanotechnology

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Deposition and properties of highly c-oriented of InN films on sapphire substrates with ECR-plasma-enhanced MOCVD — Research Paper | ScholarLens