2003•Ganguang kexue yu guanghuaxueRequires access

THE PROGRESS OF ArF EXCIMER LASER PHOTORESIST

Yu-Man Shang

Abstract

This article presented the progress of ArF excimer laser (193 nm) photoresist in last ten years.The different components of 193 nm photoresist were summarized in detail.It indicates that the fine pattern can be obtained by 193 nm lithography technology.ArF excimer laser is a leading candidate for the fabrication of fine pattern.But there are still some problems need to be resolved in the practice.

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Key concepts: Photoresist, Excimer laser, Excimer, Lithography, Fabrication, Materials science, Photolithography, Laser