2021•The Japan Society of Applied PhysicsRequires access

Growth of hexagonal boron nitride thin films on c-plane sapphire substrates by low pressure chemical vapor deposition using a cold-wall CVD-reactor

Taira Watanabe, Kazuki Matsushita, Yūki Tanaka, Riku YOSHIOKA, Katsumi Masuda, Hiroko Kominami, Kazuhiko Hara

Open publisher page 0 citations

Abstract

This record does not include an abstract. Use the full-text link above if available.

About this research paper

What this paper is about

An abstract is not available in the OpenAlex record for this paper.

Why it matters

A significance statement is not available in the OpenAlex record.

Key contribution

A contribution statement is not available in the OpenAlex record.

Method / approach

Method details are not available in the OpenAlex metadata.

Main findings

Findings are not separately available in the OpenAlex metadata.

Limitations

Limitations are not available in the OpenAlex metadata.

Applications

Application details are not available in the OpenAlex metadata.

Key concepts: Materials science, Chemical vapor deposition, Hexagonal boron nitride, Hybrid physical-chemical vapor deposition, Sapphire, Combustion chemical vapor deposition, Boron nitride, Boron

Related papers

Back to paper searchBrowse research topicsOriginal source
Growth of hexagonal boron nitride thin films on c-plane sapphire substrates by low pressure chemical vapor deposition using a cold-wall CVD-reactor — Research Paper | ScholarLens