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Plasma etching mechanisms in the fabrication of high-aspect-ratio microstructures in stacked layers of different materials

拓 岩瀬

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Key concepts: Fabrication, Microstructure, Etching (microfabrication), Materials science, Aspect ratio (aeronautics), Composite material, Nanotechnology, Layer (electronics)

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Plasma etching mechanisms in the fabrication of high-aspect-ratio microstructures in stacked layers of different materials — Research Paper | ScholarLens