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2019•Unpublished venueRequires access

Control of Projection Uniformity and Fidelity in Spatial Light Modulator-Based Holography

David Fischer, Stefan Sinzinger

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Abstract

This work describes the steps necessary for a holographic pattern projection of high quality with a phase-only Liquid crystal on silicon spatial light modulator (LCoS-SLM). The aim is high-throughput optical lithography on nonplanar surfaces. Aspects of diffractive optical element calculation as well as aspects of aberration compensation are needed to increase the uniformity and fidelity of intricate patterns.

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What this paper is about

This work describes the steps necessary for a holographic pattern projection of high quality with a phase-only Liquid crystal on silicon spatial light modulator (LCoS-SLM). The aim is high-throughput optical lithography on nonplanar surfaces. Aspects of diffractive optical element calculation as well as aspects of aberration compensation are needed to increase the uniformity and fidelity of intricate patterns.

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Available abstract

This work describes the steps necessary for a holographic pattern projection of high quality with a phase-only Liquid crystal on silicon spatial light modulator (LCoS-SLM). The aim is high-throughput optical lithography on nonplanar surfaces. Aspects of diffractive optical element calculation as well as aspects of aberration compensation are needed to increase the uniformity and fidelity of intricate patterns.

Key concepts: Spatial light modulator, Liquid crystal on silicon, Holography, Optics, Computer-generated holography, Projection (relational algebra), Lithography, Optical modulator

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