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Low pressure chemical vapor deposition (LPCVD) of titanium nitride : synthesis and characterization

Sameer Narsinha Dharmadhikari

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Key concepts: Chemical vapor deposition, Characterization (materials science), Titanium nitride, Materials science, Vapor pressure, Hybrid physical-chemical vapor deposition, Deposition (geology), Titanium

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Low pressure chemical vapor deposition (LPCVD) of titanium nitride : synthesis and characterization — Research Paper | ScholarLens