2019DEStech Transactions on Computer Science and EngineeringOpen access

Effects of Structural Parameters on Liquid Flowing in Immersion Lithography

Liang Zheng, Yu Chen

Open full text 0 citations

Abstract

The immersion liquid plays a crucial role on the pattern transfer from the projecting lens to the silicon wafer in immersion lithography. To acquire the premium quality of the image after exposure, the immersion liquid must remain highly pure and flow stably. In this paper, a mathematical model is constructed for the immersion fluid field and effects of various structural parameters on the flowing of the immersion liquid are investigated. As a result, optimal structural parameters of the immersion field are acquired to ensure the fast and stable flowing of the immersion liquid in the end.

About this research paper

What this paper is about

The immersion liquid plays a crucial role on the pattern transfer from the projecting lens to the silicon wafer in immersion lithography. To acquire the premium quality of the image after exposure, the immersion liquid must remain highly pure and flow stably. In this paper, a mathematical model is constructed for the immersion fluid field and effects of various structural parameters on the flowing of the immersion liquid are investigated. As a result, optimal structural parameters of the immersion field are acquired to ensure the fast and stable flowing of the immersion liquid in the end.

Why it matters

A significance statement is not available in the OpenAlex record.

Key contribution

A contribution statement is not available in the OpenAlex record.

Method / approach

Method details are not available in the OpenAlex metadata.

Main findings

Findings are not separately available in the OpenAlex metadata.

Limitations

Limitations are not available in the OpenAlex metadata.

Applications

Application details are not available in the OpenAlex metadata.

Available abstract

The immersion liquid plays a crucial role on the pattern transfer from the projecting lens to the silicon wafer in immersion lithography. To acquire the premium quality of the image after exposure, the immersion liquid must remain highly pure and flow stably. In this paper, a mathematical model is constructed for the immersion fluid field and effects of various structural parameters on the flowing of the immersion liquid are investigated. As a result, optimal structural parameters of the immersion field are acquired to ensure the fast and stable flowing of the immersion liquid in the end.

Key concepts: Immersion (mathematics), Immersion lithography, Wafer, Materials science, Composite material, Resist, Nanotechnology, Mathematics

Related papers

Back to paper searchBrowse research topicsOriginal source
Effects of Structural Parameters on Liquid Flowing in Immersion Lithography — Research Paper | ScholarLens