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Synthesis and characterization of silicon dioxide thin films by low pressure chemical vapor deposition using ditertiarybutylsilane and oxygen

Sung‐Jun Lee

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Key concepts: Characterization (materials science), Chemical vapor deposition, Oxygen, Thin film, Silicon dioxide, Materials science, Oxygen pressure, Combustion chemical vapor deposition

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Synthesis and characterization of silicon dioxide thin films by low pressure chemical vapor deposition using ditertiarybutylsilane and oxygen — Research Paper | ScholarLens