Pepperpot emittance measurements of ion beams from an electron beam ion source
Johanna Pitters, M. Breitenfeldt, S. Duarte Pinto, Hannes Pahl, A. Pikin, A. Shornikov, F. Wenander
Abstract
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Johanna Pitters, M. Breitenfeldt, S. Duarte Pinto, Hannes Pahl, A. Pikin, A. Shornikov, F. Wenander
Abstract
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A pepperpot emittance meter was used to measure the transverse emittance of multiply charged beams from REXEBIS, an Electron Beam Ion Source (EBIS) used for charge breeding of radioactive ion beams. The emittance meter is equipped with a Micro Channel Plate (MCP), a phosphor screen and a CCD camera for detection of the ion signal. The pulsed beam structure of low duty cycle imposes challenging constraints on the detector settings. In this article we give a careful analysis of the optimal operating parameters of the pepperpot emittance meter for ion beams of varying intensities. Emittance values for mass-separated and non-separated beams for different operating modes of the EBIS are presented. Furthermore we report on aberrations created in our injection ∕ extraction system.
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A pepperpot emittance meter was used to measure the transverse emittance of multiply charged beams from REXEBIS, an Electron Beam Ion Source (EBIS) used for charge breeding of radioactive ion beams. The emittance meter is equipped with a Micro Channel Plate (MCP), a phosphor screen and a CCD camera for detection of the ion signal. The pulsed beam structure of low duty cycle imposes challenging constraints on the detector settings. In this article we give a careful analysis of the optimal operating parameters of the pepperpot emittance meter for ion beams of varying intensities. Emittance values for mass-separated and non-separated beams for different operating modes of the EBIS are presented. Furthermore we report on aberrations created in our injection ∕ extraction system.
Key concepts: Thermal emittance, Beam emittance, Beam (structure), Ion source, Ion beam, Ion, Electron, Optics