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2018•Unpublished venueRequires access

EUV mask lifetime testing using EBL2

Chien‐Ching Wu, M.P.M.A. Limpens, Jacqueline van Veldhoven, H. H. P. Th. Bekman, Alex Deutz, E. te Sligte, A. J. Storm, Michel van Putten

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Abstract

EBL2 is TNO's platform for EUV exposure testing and surface analysis. EBL2 is capable of generating conditions relevant to EUV mask operation at all foreseen source power nodes. The authors describe how TNO performs a customized (accelerated) lifetime test on EUV masks. The required gas, EUV, and thermal parameters will be considered, and related to simulated and measured performance of EBL2. This approach can also be applied to EUV pellicles and optics.

About this research paper

What this paper is about

EBL2 is TNO's platform for EUV exposure testing and surface analysis. EBL2 is capable of generating conditions relevant to EUV mask operation at all foreseen source power nodes. The authors describe how TNO performs a customized (accelerated) lifetime test on EUV masks. The required gas, EUV, and thermal parameters will be considered, and related to simulated and measured performance of EBL2. This approach can also be applied to EUV pellicles and optics.

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Available abstract

EBL2 is TNO's platform for EUV exposure testing and surface analysis. EBL2 is capable of generating conditions relevant to EUV mask operation at all foreseen source power nodes. The authors describe how TNO performs a customized (accelerated) lifetime test on EUV masks. The required gas, EUV, and thermal parameters will be considered, and related to simulated and measured performance of EBL2. This approach can also be applied to EUV pellicles and optics.

Key concepts: Extreme ultraviolet lithography, Extreme ultraviolet, Optics, Computer science, Thermal, Power (physics), Physics, Laser

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