37‐4: A Novel Magnet‐Array Design for Solving Mask Deformation
Jian Xu, Yaoyang Liu, Yong Hai Wu
Abstract
Jian Xu, Yaoyang Liu, Yong Hai Wu
Abstract
Design of Halbach magnet array is employed to solve mask deformation due to gravity. Uniform magnetic force exerted on mask can be yielded, which balances the mask gravity. The magnetic force on the mask changes slower when deviating from the Halbach magnet array comparing with conventional magnet array.
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Design of Halbach magnet array is employed to solve mask deformation due to gravity. Uniform magnetic force exerted on mask can be yielded, which balances the mask gravity. The magnetic force on the mask changes slower when deviating from the Halbach magnet array comparing with conventional magnet array.
Key concepts: Magnet, Halbach array, Deformation (meteorology), Electropermanent magnet, Physics, Materials science, Acoustics, Mechanical engineering