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RESIDUAL STRESS IN GALLIUM NITRIDE FILMS GROWN BY METALORGANIC CHEMICAL VAPOR DEPOSITION

Ying Ian Chen

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Key concepts: Chemical vapor deposition, Gallium nitride, Residual stress, Materials science, Nitride, Stress (linguistics), Metalorganic vapour phase epitaxy, Gallium

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RESIDUAL STRESS IN GALLIUM NITRIDE FILMS GROWN BY METALORGANIC CHEMICAL VAPOR DEPOSITION — Research Paper | ScholarLens