Atomic Layer Deposition for Surface and Interface Engineering in Nanostructured Photovoltaic Devices

Atomic Layer Deposition (ALD) has become a widely adopted tool for nanotechnology, which can be devised in two subfields: the fabrication of the essential nanoscale building blocks such as nanotubes/nanowires, nanolaminates, and nanodots and surface and interface engineering with thin films for a wide range of applications. This chapter covers the most relevant research done to engineer the surfaces and interfaces with ultrathin films of differentmetal oxides deposited by ALD on geometrically complex nanostructures and discusses their application in photovoltaic devices such as in dye-sensitized solar cells (DSSC), quantum-dot-sensitized solar cells (QDSSC), colloidal quantum dot solar cells (CQDSC), organic solar cells, perovskite solar cells, and photoelectrochemical cells for water splitting. Several review articles are available to complement the chapter on the topic of surface and interface engineering for photovoltaic devices by using ALD and other deposition techniques.