Alpha particle energy response of CR-39 detectors by 50 Hz–HV electrochemical etching method
Mehdi Sohrabi, Zahra Soltani
Abstract
Mehdi Sohrabi, Zahra Soltani
Abstract
High inherent sensitivity of CR-39 to detect relatively lower-LET particles, proved efficacy of 50 Hz–HV electrochemical etching method and need to efficient alpha detection methods prompted this study. Alpha detection energy dependence (∼0.3 to ∼4.5 MeV) of 500 μm CR-39 detectors was studied. Detection efficiency increases to ∼90% flat over ∼0.8.0 to ∼4.5 MeV alpha energy for 10 N and 15 N KOH solutions for 8 h at 26 °C. Efficiency versus stopping power responses follow the efficiency-energy responses while mean track diameters are linear functions of stopping power of a helium ion. The method provides some advantages over 2 kHz–HV method.
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High inherent sensitivity of CR-39 to detect relatively lower-LET particles, proved efficacy of 50 Hz–HV electrochemical etching method and need to efficient alpha detection methods prompted this study. Alpha detection energy dependence (∼0.3 to ∼4.5 MeV) of 500 μm CR-39 detectors was studied. Detection efficiency increases to ∼90% flat over ∼0.8.0 to ∼4.5 MeV alpha energy for 10 N and 15 N KOH solutions for 8 h at 26 °C. Efficiency versus stopping power responses follow the efficiency-energy responses while mean track diameters are linear functions of stopping power of a helium ion. The method provides some advantages over 2 kHz–HV method.
Key concepts: Alpha particle, Stopping power, Ion, Detector, Etching (microfabrication), Materials science, Sensitivity (control systems), Energy (signal processing)