A new substrate engineering for the formation of empty space in silicon (ESS) induced by silicon surface migration
Tsutomu Sato, Nozomi Aoki, Ichiro Mizushima, Yoshitaka Tsunashima
Abstract
Tsutomu Sato, Nozomi Aoki, Ichiro Mizushima, Yoshitaka Tsunashima
Abstract
A new technique to form empty spaces in silicon substrates is presented. The empty space with various shapes, such as plate as well as sphere and pipe, could be formed under the surface of the silicon substrate.
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A new technique to form empty spaces in silicon substrates is presented. The empty space with various shapes, such as plate as well as sphere and pipe, could be formed under the surface of the silicon substrate.
Key concepts: Silicon, Substrate (aquarium), Materials science, Space (punctuation), Surface (topology), Optoelectronics, Geometry, Computer science