2003Unpublished venueRequires access

A new substrate engineering for the formation of empty space in silicon (ESS) induced by silicon surface migration

Tsutomu Sato, Nozomi Aoki, Ichiro Mizushima, Yoshitaka Tsunashima

Open publisher page 19 citations

Abstract

A new technique to form empty spaces in silicon substrates is presented. The empty space with various shapes, such as plate as well as sphere and pipe, could be formed under the surface of the silicon substrate.

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What this paper is about

A new technique to form empty spaces in silicon substrates is presented. The empty space with various shapes, such as plate as well as sphere and pipe, could be formed under the surface of the silicon substrate.

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OpenAlex reports 19 citations for this work. Citation counts describe recorded attention and do not establish research quality.

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Available abstract

A new technique to form empty spaces in silicon substrates is presented. The empty space with various shapes, such as plate as well as sphere and pipe, could be formed under the surface of the silicon substrate.

Key concepts: Silicon, Substrate (aquarium), Materials science, Space (punctuation), Surface (topology), Optoelectronics, Geometry, Computer science

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