1960Advances in X-ray AnalysisRequires access

Fluorescence Analysis of Trace Amounts of Hafnium in Zirconium Using a Silicon Crystal

Jason C. Parks, D.G. Plackmann, G.H. Beyer

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Abstract

Abstract The proper choice of an analyzing crystal sometimes makes It possible to suppress second-order reflections which interfere with X-ray fluorescence analysis. Some of the problems associated with the analysis of small amounts of hafnium in zirconium, using a silicon crystal and a pulse-height analyzer, are discussed.

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Abstract The proper choice of an analyzing crystal sometimes makes It possible to suppress second-order reflections which interfere with X-ray fluorescence analysis. Some of the problems associated with the analysis of small amounts of hafnium in zirconium, using a silicon crystal and a pulse-height analyzer, are discussed.

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Available abstract

Abstract The proper choice of an analyzing crystal sometimes makes It possible to suppress second-order reflections which interfere with X-ray fluorescence analysis. Some of the problems associated with the analysis of small amounts of hafnium in zirconium, using a silicon crystal and a pulse-height analyzer, are discussed.

Key concepts: Hafnium, Zirconium, Silicon, Fluorescence, Crystal (programming language), Materials science, TRACE (psycholinguistics), Trace Amounts

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