360-nm Photoluminescence from Silicon Oxide Films Embedded with Silicon Nanocrystals
Yang Linlin, Guo Hengqun, Zeng Youhua, Qiming Wang
Abstract
Yang Linlin, Guo Hengqun, Zeng Youhua, Qiming Wang
Abstract
Si-rich silicon oxide films were deposited by RF magnetron sputtering onto composite Si/SiO2 targets. After annealed at different temperature, the silicon oxide films embedded with silicon nanocrystals were obtained. The photoluminescenee(PL) from the silicon oxide films embedded with silicon nanocrystals was observed at room temperature. The strong peak is at 360 nm, its position is independent of the annealing temperature. The origin of the 360-nm PL in the silicon oxide films embedded with silicon nanoerystals was discussed.
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Si-rich silicon oxide films were deposited by RF magnetron sputtering onto composite Si/SiO2 targets. After annealed at different temperature, the silicon oxide films embedded with silicon nanocrystals were obtained. The photoluminescenee(PL) from the silicon oxide films embedded with silicon nanocrystals was observed at room temperature. The strong peak is at 360 nm, its position is independent of the annealing temperature. The origin of the 360-nm PL in the silicon oxide films embedded with silicon nanoerystals was discussed.
Key concepts: Silicon, Materials science, Silicon oxide, Oxide thin-film transistor, Annealing (glass), Photoluminescence, Optoelectronics, Oxide