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THE EFFECT OF ION PARAMETERS ON MICROSTRUCTURE AND THEIR PROPERTIES OF PVD HARD COATINGS

Zhenhua Wu

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Abstract

Physical vapor deposition(PVD)methods have found widespread appli-cation the deposition of hard coatings. In order to compare potential and limi-tations of the PVD methods, a good knowledge of the physical processes offilm growth, formation of various film microstructures, and the resultingproperties iS necessary. Here the latest advances in understanding the ef-fect of physical film growth parameter on the microstructure of growingfilms are reviewed.Examples of sputtered TiN film microstructure are given.A critical review of the structure zone models is presented.

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Physical vapor deposition(PVD)methods have found widespread appli-cation the deposition of hard coatings. In order to compare potential and limi-tations of the PVD methods, a good knowledge of the physical processes offilm growth, formation of various film microstructures, and the resultingproperties iS necessary. Here the latest advances in understanding the ef-fect of physical film growth parameter on the microstructure of growingfilms are reviewed.Examples of sputtered TiN film microstructure are given.A critical review of the structure zone models is presented.

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Available abstract

Physical vapor deposition(PVD)methods have found widespread appli-cation the deposition of hard coatings. In order to compare potential and limi-tations of the PVD methods, a good knowledge of the physical processes offilm growth, formation of various film microstructures, and the resultingproperties iS necessary. Here the latest advances in understanding the ef-fect of physical film growth parameter on the microstructure of growingfilms are reviewed.Examples of sputtered TiN film microstructure are given.A critical review of the structure zone models is presented.

Key concepts: Microstructure, Physical vapor deposition, Vapour deposition, Materials science, Tin, Deposition (geology), Metallurgy, Chemical vapor deposition

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