2003•Microfabrication TechnologyRequires access

Study of Electron-beam Micro Stereo Lithography

Kong Xiang-dong

Abstract

Based on the IH (Integrated Harden Polymer Stereo Lithography)technique,a novel electron-beam micro-stereo-lithography method is presented and analyzed theoretically. Experiments have been made to investigate the gasification of epoxy resin-618, WSJ-202 and Suzhou-2 resist in SDV-II vacuum room with the vacuum of 1.33 Pa. The results show that some liquid resists are suitable for electron-beam stereo lithography in vacuum.

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Available abstract

Key concepts: Resist, Electron-beam lithography, Lithography, Stencil lithography, X-ray lithography, Cathode ray, Materials science, Epoxy