Effect of NH_4C1/KC1 as the Additives on the Nitridation of AluminiumPowders
Gao Lian
Abstract
Gao Lian
Abstract
The effect of NH4Cl/KCl as the additives on the nitridation of aluminium powders was investigated. Pure nanosized AlN powders were obtained after nitriding Al powders at 1000℃ for 5h when NH4Cl/KCl was used as the additives. TG/DSC analysis was used to record the nitridation process of aluminium powders when different additives such as NH4Cl, KCl and NH4Cl/KCl were used. The resulting powders under different experiment conditions were characterized by XRD, SEM and XRF. The results show that NH4Cl can lower the nitridation temperature and prevent the melting and coalescence of reactant Al particles, thus nanosized AlN particles will be obtained. Apertures generated by the evaporation of KCl avoid the formation of a dense nitride layer on Al particles and enable the diffusion of NH3 to complete the nitridation of Al. NH3 as the reactant gas can eliminate the effect of moisture impurity introduced by additives. NH4Cl/KCl is a good additive with low residue and for the production of high purity AlN.
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The effect of NH4Cl/KCl as the additives on the nitridation of aluminium powders was investigated. Pure nanosized AlN powders were obtained after nitriding Al powders at 1000℃ for 5h when NH4Cl/KCl was used as the additives. TG/DSC analysis was used to record the nitridation process of aluminium powders when different additives such as NH4Cl, KCl and NH4Cl/KCl were used. The resulting powders under different experiment conditions were characterized by XRD, SEM and XRF. The results show that NH4Cl can lower the nitridation temperature and prevent the melting and coalescence of reactant Al particles, thus nanosized AlN particles will be obtained. Apertures generated by the evaporation of KCl avoid the formation of a dense nitride layer on Al particles and enable the diffusion of NH3 to complete the nitridation of Al. NH3 as the reactant gas can eliminate the effect of moisture impurity introduced by additives. NH4Cl/KCl is a good additive with low residue and for the production of high purity AlN.
Key concepts: Materials science, Nitriding, Aluminium, Chemical engineering, Impurity, Nitride, Coalescence (physics), Metallurgy