2006Microfabrication TechnologyRequires access

Holographic-melting Photoresist Technology of Fabrication of Micro-cylindrical Lens Arrays

Zhibin Ren

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Abstract

A new fabricating method of micro-cylindrical lens arrays by adopting holographic exposure-melting photoresist technology is studied to improve the fabrication technology of micro-cylindrical lens arrays and eliminate dependence of photo-masks during photolithography.The photoresist is exposed by holographic technology and then melted to make a fine micro-cylindrical lens array on the K9 glass substrate.The results show that a fine sinusoidal array structure is formed on the photoresist surface by holographic exposure and it is changed into a micro-cylindrical lens array by melting of the photoresist.The result provides a new technology of fabrication of micro-cylindrical lens arrays and it is significant to further improve of the fabrication technology of micro-cylindrical lens arrays.

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What this paper is about

A new fabricating method of micro-cylindrical lens arrays by adopting holographic exposure-melting photoresist technology is studied to improve the fabrication technology of micro-cylindrical lens arrays and eliminate dependence of photo-masks during photolithography.The photoresist is exposed by holographic technology and then melted to make a fine micro-cylindrical lens array on the K9 glass substrate.The results show that a fine sinusoidal array structure is formed on the photoresist surface by holographic exposure and it is changed into a micro-cylindrical lens array by melting of the photoresist.The result provides a new technology of fabrication of micro-cylindrical lens arrays and it is significant to further improve of the fabrication technology of micro-cylindrical lens arrays.

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Available abstract

A new fabricating method of micro-cylindrical lens arrays by adopting holographic exposure-melting photoresist technology is studied to improve the fabrication technology of micro-cylindrical lens arrays and eliminate dependence of photo-masks during photolithography.The photoresist is exposed by holographic technology and then melted to make a fine micro-cylindrical lens array on the K9 glass substrate.The results show that a fine sinusoidal array structure is formed on the photoresist surface by holographic exposure and it is changed into a micro-cylindrical lens array by melting of the photoresist.The result provides a new technology of fabrication of micro-cylindrical lens arrays and it is significant to further improve of the fabrication technology of micro-cylindrical lens arrays.

Key concepts: Photoresist, Fabrication, Holography, Lens (geology), Materials science, Photolithography, Microlens, Molding (decorative)

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