Analysis on patent technology of X-ray instrument

Objective: To make the better understanding on the status of patent application to technical staff and enterprises worked on X-ray field, provide reference for technical development and patent application though the analysis on patent technology of X-ray instrument. Methods: Combined international patent classification with keywords for searching the patents related X-ray instrument both in domestic and international and analyzed patent application amount, area distribution, principal applicant and important technology for the searched patents. Results: Some information about global amount of patent application over the years, country and area distribution of the patent technology, patent application status of principal applicant is obtained in the X-ray technology field. Conclusion: The amount of patent application in the field of X-ray instrument technology is rising year by year both around the world and in china. There is a big gap between domestic corporations and large foreign companies in the amount of patent application, patent validity and integrity of patent layout.