Electroless Nickel Plating of Low-Phosphorous on Glass
Qin Tie-nan
Abstract
Qin Tie-nan
Abstract
The process for electroless nickel plating of low-phosphorous on glass was optimized by orthogonal experiment.The optimal parameters obtained are: sodium citrate 15 g/L,ammonium chloride 20 g/L,sodium hypophosphite 30 g/L,pH 8.The morphology,composition and phase structure of the Ni-P deposit were analyzed by the XRD,SEM and EDX techniques.The results show that the Ni-P coating obtained under the optimal conditions has a compact cellular structure,of which the phosphorus mass fraction is 1.78 %,belonging to low-phosphorous coating with a microcrystalline structure.
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The process for electroless nickel plating of low-phosphorous on glass was optimized by orthogonal experiment.The optimal parameters obtained are: sodium citrate 15 g/L,ammonium chloride 20 g/L,sodium hypophosphite 30 g/L,pH 8.The morphology,composition and phase structure of the Ni-P deposit were analyzed by the XRD,SEM and EDX techniques.The results show that the Ni-P coating obtained under the optimal conditions has a compact cellular structure,of which the phosphorus mass fraction is 1.78 %,belonging to low-phosphorous coating with a microcrystalline structure.
Key concepts: Sodium hypophosphite, Microcrystalline, Materials science, Hypophosphite, Nickel, Plating (geology), Phosphorus, Sodium