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Study on Fine Structure of Pack Cementation Siliconizing Layer on Surface of Cr18Ni9 Austenitic Stainless Steel

Li Pan

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Abstract

A fine and dense siliconized layer was obtained on the surface of Cr18Ni9 austenitic stainless steel by pack cementation siliconizing.Using SEM and EDS the composition,microstructure and morphologies of the siliconized layer were analyzed.The results indicate that the siliconized layer with the thickness over 50 μm can be obtained by diffusion treatment at 1 050 ℃ for 4~6 h taking Si-Fe alloy with 70wt% Si as mixed powder,Si2O as packing agent and NaF as activating agent.The fine microstructure of the main siliconized layer is spinodal decomposition product,the distribution of which from outer surface to inner layer is closely related to the gradient of silicon.

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What this paper is about

A fine and dense siliconized layer was obtained on the surface of Cr18Ni9 austenitic stainless steel by pack cementation siliconizing.Using SEM and EDS the composition,microstructure and morphologies of the siliconized layer were analyzed.The results indicate that the siliconized layer with the thickness over 50 μm can be obtained by diffusion treatment at 1 050 ℃ for 4~6 h taking Si-Fe alloy with 70wt% Si as mixed powder,Si2O as packing agent and NaF as activating agent.The fine microstructure of the main siliconized layer is spinodal decomposition product,the distribution of which from outer surface to inner layer is closely related to the gradient of silicon.

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Available abstract

A fine and dense siliconized layer was obtained on the surface of Cr18Ni9 austenitic stainless steel by pack cementation siliconizing.Using SEM and EDS the composition,microstructure and morphologies of the siliconized layer were analyzed.The results indicate that the siliconized layer with the thickness over 50 μm can be obtained by diffusion treatment at 1 050 ℃ for 4~6 h taking Si-Fe alloy with 70wt% Si as mixed powder,Si2O as packing agent and NaF as activating agent.The fine microstructure of the main siliconized layer is spinodal decomposition product,the distribution of which from outer surface to inner layer is closely related to the gradient of silicon.

Key concepts: Materials science, Microstructure, Cementation (geology), Layer (electronics), Austenite, Spinodal decomposition, Surface layer, Composite material

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