2007•Infrared and Laser EngineeringRequires access

Critically adjustment of high reflectivity measurement system

Chen Men-xue

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Abstract

During precise measurement of high reflectivity,cavity adjustment has great influence on reflectivity measurement results.Structure and working principle of the high reflectivity measurement system are introduced,and those factors that influence on its metrical precision are analyzed.According to theory analysis,precision of this system is 9.1×10-6.Experimental measurements for capability of this system are carried out,and the cavity is adjusted by two criteria.Results show that RMS of measurement in linear cavity is better than 7×10-6,and the biggest measurement error is 1.3×10-5,which is in agreement with the analysis.

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What this paper is about

During precise measurement of high reflectivity,cavity adjustment has great influence on reflectivity measurement results.Structure and working principle of the high reflectivity measurement system are introduced,and those factors that influence on its metrical precision are analyzed.According to theory analysis,precision of this system is 9.1×10-6.Experimental measurements for capability of this system are carried out,and the cavity is adjusted by two criteria.Results show that RMS of measurement in linear cavity is better than 7×10-6,and the biggest measurement error is 1.3×10-5,which is in agreement with the analysis.

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Available abstract

During precise measurement of high reflectivity,cavity adjustment has great influence on reflectivity measurement results.Structure and working principle of the high reflectivity measurement system are introduced,and those factors that influence on its metrical precision are analyzed.According to theory analysis,precision of this system is 9.1×10-6.Experimental measurements for capability of this system are carried out,and the cavity is adjusted by two criteria.Results show that RMS of measurement in linear cavity is better than 7×10-6,and the biggest measurement error is 1.3×10-5,which is in agreement with the analysis.

Key concepts: Reflectivity, System of measurement, Optics, Observational error, Materials science, Accuracy and precision, Mathematics, Statistics

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