2005•Electro-mechanical EngineeringRequires access

A Study on the Cleaning Technology for Sapphire Wafer

Hai Zhou

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Abstract

The significance of sapphire wafer cleaning in growing of GaN is explained.The cleaning principle of sapphire wafers is discussed.The cleaning solution and technology of the sapphire wafer suitable for industrial production are presented and varified by cleaning experiments.Sapphire wafer can be used in photoelectronics without re-cleaning by this method.

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The significance of sapphire wafer cleaning in growing of GaN is explained.The cleaning principle of sapphire wafers is discussed.The cleaning solution and technology of the sapphire wafer suitable for industrial production are presented and varified by cleaning experiments.Sapphire wafer can be used in photoelectronics without re-cleaning by this method.

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Available abstract

The significance of sapphire wafer cleaning in growing of GaN is explained.The cleaning principle of sapphire wafers is discussed.The cleaning solution and technology of the sapphire wafer suitable for industrial production are presented and varified by cleaning experiments.Sapphire wafer can be used in photoelectronics without re-cleaning by this method.

Key concepts: Wafer, Sapphire, Materials science, Silicon on sapphire, Wafer dicing, Optoelectronics, Silicon, Optics

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