Study on deposition mode and rate in pulsed laser deposition of Al film

Bulk aluminium material is chosen as targets to prepare pure Al film by the method of pulsed laser deposition(PLD).The thickness uniformity of Al film in coaxial and side-axial deposition modes is also studied comparatively.Besides,the effects of substrate temperature,laser power and repetition rate on deposition rate of Al film in side-axial deposition mode are investigated respectively.The results show that the thickness uniformity of the film gotten in side-axial deposition mode is better than that in coaxial deposition mode.The deposition rate of Al film decreases with the increase of the substrate temperature.However,the deposition rate of Al film increases with increasing laser power.Especially,there is a maximum deposition rate of Al film by varying the laser repetition rate.The above method and results can be used as a theoretical guidance for big area film deposition by PLD in application.