Measurement of thermal diffusivity of SiO_2 thin films using AC calorimetric method

This paper describes the principle and experiment setup of AC calorimetric method for measuring thermal diffusivity of SiO 2 thin films. In the experiment, a laser source that the pulse duration was in the range of nanoseconds was used to heat up the samples. Using AC calorimetric method, the inplane thermal diffusivities of SiO 2 thin films with the thickness of 100nm and 500nm were measured, respectively. The results show that the thermal diffusivity of the thin film was smaller than its corresponding bulk material, and with the decreasing of the film thickness, the thermal diffusivity also decreasing.