A Study on Frequency Performance of SiGe HBT Based on SOI Structure
Mo‐Hua Yang
Abstract
Mo‐Hua Yang
Abstract
Based on the theory of SOI technology,the frequency performance of SiGe HBT's with SOI structure is simulated.Compared with the bulk SiGe HBT,simulation results show that the buried oxide layer,BOX,can reduce the collector-base capacitance C_(cb) and the substrate-base capacitance C_(sb) by 94.7% and 94.6% in maximum,respectively.And the maximum oscillation frequency is improved by a factor of 2.7.The study demonstrates that SOI structure greatly improves the frequency performance of SiGe HBT's,and so,it is applicable for high-speed and high power IC's.
A significance statement is not available in the OpenAlex record.
A contribution statement is not available in the OpenAlex record.
Method details are not available in the OpenAlex metadata.
Findings are not separately available in the OpenAlex metadata.
Limitations are not available in the OpenAlex metadata.
Application details are not available in the OpenAlex metadata.
Based on the theory of SOI technology,the frequency performance of SiGe HBT's with SOI structure is simulated.Compared with the bulk SiGe HBT,simulation results show that the buried oxide layer,BOX,can reduce the collector-base capacitance C_(cb) and the substrate-base capacitance C_(sb) by 94.7% and 94.6% in maximum,respectively.And the maximum oscillation frequency is improved by a factor of 2.7.The study demonstrates that SOI structure greatly improves the frequency performance of SiGe HBT's,and so,it is applicable for high-speed and high power IC's.
Key concepts: Heterojunction bipolar transistor, Silicon on insulator, Capacitance, Materials science, Oscillation (cell signaling), Optoelectronics, Substrate (aquarium), Base (topology)