2002Chinese Journal of LasersRequires access

Study on Metastable Neon Beam Source Used for Atom Lithography

Yuzhu Wang

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Abstract

A neon metastable beam source was built up, from which Neon metastable beam of the intensity of 3.3×10 14 atoms/s·Sr. was generated. The characteristics of the metastable Neon beam were studied, and the corresponding mechanisms are discussed.

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What this paper is about

A neon metastable beam source was built up, from which Neon metastable beam of the intensity of 3.3×10 14 atoms/s·Sr. was generated. The characteristics of the metastable Neon beam were studied, and the corresponding mechanisms are discussed.

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Available abstract

A neon metastable beam source was built up, from which Neon metastable beam of the intensity of 3.3×10 14 atoms/s·Sr. was generated. The characteristics of the metastable Neon beam were studied, and the corresponding mechanisms are discussed.

Key concepts: Neon, Metastability, Atomic physics, Beam (structure), Materials science, Atom (system on chip), Physics, Optics

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