Guy M. Burrow, Matthieu C. R. Leibovici, Thomas K. Gaylord
Abstract
Pattern-integrated interference lithography (PIIL), a new method integrating superposed pattern imaging with interference lithography, is presented. A prototype implementation is used to demonstrate PIIL potential through the single-exposure fabrication of representative photonic crystal structures.
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Pattern-integrated interference lithography (PIIL), a new method integrating superposed pattern imaging with interference lithography, is presented. A prototype implementation is used to demonstrate PIIL potential through the single-exposure fabrication of representative photonic crystal structures.
Key concepts: Interference lithography, Lithography, Interference (communication), X-ray lithography, Maskless lithography, Next-generation lithography, Photolithography, Photonic crystal