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2007•ECS TransactionsRequires access

Design, Simulation, Fabrication and Characterization of a Pressure Sensor arranged in Wheatstone Piezoresistive Bridge

Alessandro Camolesi, Pablo R. de Souza, Fabiano Fruett

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Abstract

In this paper, a Wheatstone piezoresistive bridge was designed, simulated, fabricated and characterized. The Finite Elements Method was used to simulate both: the piezoeffect in a single-resistor and the stress-induced unbalance in a Wheatstone piezoresistive bridge. The process, used to fabricate the Wheatstone piezoresistive bridge sensor, is totally CMOS compatible.

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What this paper is about

In this paper, a Wheatstone piezoresistive bridge was designed, simulated, fabricated and characterized. The Finite Elements Method was used to simulate both: the piezoeffect in a single-resistor and the stress-induced unbalance in a Wheatstone piezoresistive bridge. The process, used to fabricate the Wheatstone piezoresistive bridge sensor, is totally CMOS compatible.

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OpenAlex reports 2 citations for this work. Citation counts describe recorded attention and do not establish research quality.

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Available abstract

In this paper, a Wheatstone piezoresistive bridge was designed, simulated, fabricated and characterized. The Finite Elements Method was used to simulate both: the piezoeffect in a single-resistor and the stress-induced unbalance in a Wheatstone piezoresistive bridge. The process, used to fabricate the Wheatstone piezoresistive bridge sensor, is totally CMOS compatible.

Key concepts: Wheatstone bridge, Piezoresistive effect, Resistor, Materials science, Fabrication, Bridge (graph theory), Optoelectronics, Pressure sensor

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