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Deposition of titanium nitride on porous glass by plasma-enhanced chemical vapor deposition.

Shigeharu Tamura, Tetsuo Yazawa, Toshiyuki Mihara, Sabro KIMURA, Tadashi ISHIDA, Sadao NAKAJIMA

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Key concepts: Chemical vapor deposition, Deposition (geology), Materials science, Titanium nitride, Porosity, Plasma-enhanced chemical vapor deposition, Chemical engineering, Nitride

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Deposition of titanium nitride on porous glass by plasma-enhanced chemical vapor deposition. — Research Paper | ScholarLens