2008•EU PVSECOpen access

Low Cost TCO Technology for a-Si Thin Film Solar Cell

C.-K. Park, J.-H. Kim, Chengyan Yang, K.-S. Lee, Gi-Chung Kwon, Jungpyo Hong

Open full text 0 citations

Abstract

We have developed large scale (1100×1300mm) in-house ZnO TCO using SDCVD (Space Divided Chemical Vapor Deposition) to substitute commercialized SnO2:F based TCO. In-house ZnO TCO was investigated based on the low cost soda lime glass and was compared with SnO2:F TCO based on the low iron white glass for the application of a-Si solar cell. Boron and hydrogen were used as a co-dopant to control electrical properties. Post treatment using hydrogen plasma was performed in order to boost the effect of co-doping. Co-doping was proved to have a positive effect on FF and Jsc compared to boron single doping. Electrical characteristics showed the sheet resistance of ZnO around 8Ω/ with minimum value of 6Ω/ at the thickness of 1.2 . Optical properties showed the transmittance more than 91.3% and the haze of 5.7% without a glass substrate in the range of 350~1100 nm. Conversion cell efficiency of a-Si using ZnO TCO was comparable to or higher than the high cost SnO2:F TCO depending on the process condition..

About this research paper

What this paper is about

We have developed large scale (1100×1300mm) in-house ZnO TCO using SDCVD (Space Divided Chemical Vapor Deposition) to substitute commercialized SnO2:F based TCO. In-house ZnO TCO was investigated based on the low cost soda lime glass and was compared with SnO2:F TCO based on the low iron white glass for the application of a-Si solar cell. Boron and hydrogen were used as a co-dopant to control electrical properties. Post treatment using hydrogen plasma was performed in order to boost the effect of co-doping. Co-doping was proved to have a positive effect on FF and Jsc compared to boron single doping. Electrical characteristics showed the sheet resistance of ZnO around 8Ω/ with minimum value of 6Ω/ at the thickness of 1.2 . Optical properties showed the transmittance more than 91.3% and the haze of 5.7% without a glass substrate in the range of 350~1100 nm. Conversion cell efficiency of a-Si using ZnO TCO was comparable to or higher than the high cost SnO2:F TCO depending on the process condition..

Why it matters

A significance statement is not available in the OpenAlex record.

Key contribution

A contribution statement is not available in the OpenAlex record.

Method / approach

Method details are not available in the OpenAlex metadata.

Main findings

Findings are not separately available in the OpenAlex metadata.

Limitations

Limitations are not available in the OpenAlex metadata.

Applications

Application details are not available in the OpenAlex metadata.

Available abstract

We have developed large scale (1100×1300mm) in-house ZnO TCO using SDCVD (Space Divided Chemical Vapor Deposition) to substitute commercialized SnO2:F based TCO. In-house ZnO TCO was investigated based on the low cost soda lime glass and was compared with SnO2:F TCO based on the low iron white glass for the application of a-Si solar cell. Boron and hydrogen were used as a co-dopant to control electrical properties. Post treatment using hydrogen plasma was performed in order to boost the effect of co-doping. Co-doping was proved to have a positive effect on FF and Jsc compared to boron single doping. Electrical characteristics showed the sheet resistance of ZnO around 8Ω/ with minimum value of 6Ω/ at the thickness of 1.2 . Optical properties showed the transmittance more than 91.3% and the haze of 5.7% without a glass substrate in the range of 350~1100 nm. Conversion cell efficiency of a-Si using ZnO TCO was comparable to or higher than the high cost SnO2:F TCO depending on the process condition..

Key concepts: Solar cell, Thin film solar cell, Materials science, Optoelectronics, Thin film, Computer science, Engineering physics, Nanotechnology

Related papers

Back to paper searchBrowse research topicsOriginal source
Low Cost TCO Technology for a-Si Thin Film Solar Cell — Research Paper | ScholarLens