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1993•International Conference on VLSI and CADRequires access

Sub-Halfmicron Lithography Using an I-line Modified Illumination Techniques

Youn suk Lee, Seung Chan Moon, Tai Kyung Won, Jung Hwan Lee, Hyeong Soo Kim, Keun Young Kim, Dong Jun Ahn, Soo Han Choi

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Key concepts: Lithography, Line (geometry), Immersion lithography, Computer science, Materials science, Optoelectronics, Resist, Nanotechnology

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