2011•한국진공학회 학술발표회초록집Requires access

Prevention of P-i Interface Contamination Using In-situ Plasma Process in Single-chamber VHF-PECVD Process for a-Si:H Solar Cells

Seunghee Han, Jun-Hong Jeon, Jin-Young Choi, Won-Woong Park

Open publisher page 0 citations

Abstract

This record does not include an abstract. Use the full-text link above if available.

About this research paper

What this paper is about

An abstract is not available in the OpenAlex record for this paper.

Why it matters

A significance statement is not available in the OpenAlex record.

Key contribution

A contribution statement is not available in the OpenAlex record.

Method / approach

Method details are not available in the OpenAlex metadata.

Main findings

Findings are not separately available in the OpenAlex metadata.

Limitations

Limitations are not available in the OpenAlex metadata.

Applications

Application details are not available in the OpenAlex metadata.

Key concepts: Plasma-enhanced chemical vapor deposition, Contamination, Process (computing), Materials science, In situ, Single chamber, Plasma, Analytical Chemistry (journal)

Back to paper search Browse research topics Original source

Prevention of P-i Interface Contamination Using In-situ Plasma Process in Single-chamber VHF-PECVD Process for a-Si:H Solar Cells — Research Paper | ScholarLens