Epitaxial emitter reverse saturation current density: Modeling and experimental validation
John S. Renshaw, J.M. Gee
Abstract
John S. Renshaw, J.M. Gee
Abstract
Through numerical simulation we explore the sensitivity of the emitter reverse saturation current density (J0e) to surface recombination velocity (SRV) of a uniformly doped phosphorus emitter compared with gaussian profile with similar sheet resistance. The uniformly doped emitter is capable of extremely low J0e's of2, but is very transparent and thus extremely sensitive to the surface recombination velocity. While the gaussian profile cannot reach as low recombination, it is however more resilient to higher SRV's. Finally, we experimentally demonstrate a 2 fA/cm2total device J0on a test structure with the same epi emitter explored in the previous simulations.
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Through numerical simulation we explore the sensitivity of the emitter reverse saturation current density (J0e) to surface recombination velocity (SRV) of a uniformly doped phosphorus emitter compared with gaussian profile with similar sheet resistance. The uniformly doped emitter is capable of extremely low J0e's of2, but is very transparent and thus extremely sensitive to the surface recombination velocity. While the gaussian profile cannot reach as low recombination, it is however more resilient to higher SRV's. Finally, we experimentally demonstrate a 2 fA/cm2total device J0on a test structure with the same epi emitter explored in the previous simulations.
Key concepts: Common emitter, Saturation current, Saturation (graph theory), Physics, Recombination, Gaussian, Analytical Chemistry (journal), Optoelectronics