Influence of ion implantation on the near-surface structure of thin Ni and Pd films on lithium niobate and lithium tantalate

The systems "thin Ni film -lithium niobate" and "thin Pd film -lithium tantalate" are implanted by Ar + ions with an energy of 100 keV and a dose of 10 16 cm -2 .Analyses of the systems by AFM and SEM have shown that the ion implantation essentially modifies the near-surface structure resulting in a change of its optical, electrical, and mechanical properties.Strong difference in the near-surface structures between implanted systems with Ni or Pd thin films is observed.Such a difference is explained by the heterogeneity of an ion beam and different properties of the materials.The application to the development of high-sensitive pyroelectric detectors with high damage threshold is proposed.