THE RF GUN: MANUFACTURING AND PROOF OF PRECISION BY FIELD PROFILE MEASUREMENTS
U. Ellenberger, Heinrich Blumer, Alessandro Citterio, Ludwig Paly, Markus Probst
Abstract
U. Ellenberger, Heinrich Blumer, Alessandro Citterio, Ludwig Paly, Markus Probst
Abstract
The high brightness electron source for SwissFEL is an in-house built 2.6 cell normal-conducting RF gun which is scaled to the RF frequency of 2’998.8 MHz. The RF gun is capable of operating at 100 Hz repetition rate and produces electron bunches at the exit of the RF gun of an energy of 7 MeV. Key features of the RF gun are described and how they have been implemented in the manufacturing process. RF field measurements of the RF gun are presented to account for the mechanical precision reached after manufacturing. The RF gun has been thoroughly tested in the SwissFEL injector test facility.
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The high brightness electron source for SwissFEL is an in-house built 2.6 cell normal-conducting RF gun which is scaled to the RF frequency of 2’998.8 MHz. The RF gun is capable of operating at 100 Hz repetition rate and produces electron bunches at the exit of the RF gun of an energy of 7 MeV. Key features of the RF gun are described and how they have been implemented in the manufacturing process. RF field measurements of the RF gun are presented to account for the mechanical precision reached after manufacturing. The RF gun has been thoroughly tested in the SwissFEL injector test facility.
Key concepts: Electron gun, Radio frequency, Injector, RF power amplifier, RF probe, Electrical engineering, Materials science, Optics