Analysis of external quantum efficiencies of GaN homojunction p-i-n ultraviolet photodetectors
Ting Li, John C. Carrano, J.C. Cambell, M. Schurman, Ian T. Ferguson
Abstract
Ting Li, John C. Carrano, J.C. Cambell, M. Schurman, Ian T. Ferguson
Abstract
We have fabricated and characterized a series of homojunction p-i-n ultraviolet (UV) photodetectors on GaN grown by metalorganic chemical vapor deposition (MOCVD). They exhibit record low dark current densities (/spl sim/2 nA/cm/sup 2/ at -10-V bias) and high external quantum efficiencies (/spl sim/45% at /spl lambda/=362 nm). We have analyzed the spectral external quantum efficiency of these photodiodes using a standard drift-diffusion model and studied its bias dependence. We have found that an optical "dead space" exists underneath the top surface of the p-GaN layer, which may be attributed to the internal electrical field at the p-GaN surface. The presence of this region prevents a meaningful extraction of the electron diffusion length from the quantum efficiency data.
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We have fabricated and characterized a series of homojunction p-i-n ultraviolet (UV) photodetectors on GaN grown by metalorganic chemical vapor deposition (MOCVD). They exhibit record low dark current densities (/spl sim/2 nA/cm/sup 2/ at -10-V bias) and high external quantum efficiencies (/spl sim/45% at /spl lambda/=362 nm). We have analyzed the spectral external quantum efficiency of these photodiodes using a standard drift-diffusion model and studied its bias dependence. We have found that an optical "dead space" exists underneath the top surface of the p-GaN layer, which may be attributed to the internal electrical field at the p-GaN surface. The presence of this region prevents a meaningful extraction of the electron diffusion length from the quantum efficiency data.
Key concepts: Homojunction, Metalorganic vapour phase epitaxy, Quantum efficiency, Chemical vapor deposition, Optoelectronics, Photodetector, Materials science, Ultraviolet