2005IEEE Transactions on Microwave Theory and TechniquesRequires access

Scaling and technological limitations of 1/f noise and oscillator phase noise in SiGe HBTs

Guofu Niu, J. van der Tang, Zhiming Feng, Alvin Joseph, D.L. Harame

Open publisher page 23 citations

Abstract

This paper examines the impact of SiGe HBT scaling on 1/f noise and phase noise of oscillators and frequency synthesizers. The increase of transistor speed with scaling is shown to significantly increase the sensitivity of oscillation frequency to 1/f noise and, thus, degrade close-in phase noise, but decrease the sensitivity of oscillation frequency to base current shot noise and base resistance thermal noises. The results show that corner offset frequency defined by the intersect of the 1/f/sup 3/ and 1/f/sup 2/ phase noise has little to do with the traditional 1/f corner frequency. The relative importance of individual noise sources in determining phase noise is examined as a function of technology scaling, device sizing, and oscillation frequency. The collector current shot noise and base resistance noise are shown to set the fundamental limits of phase noise reduction. A methodology to identify the maximum tolerable 1/f K factor is established and demonstrated for the HBTs used.

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What this paper is about

This paper examines the impact of SiGe HBT scaling on 1/f noise and phase noise of oscillators and frequency synthesizers. The increase of transistor speed with scaling is shown to significantly increase the sensitivity of oscillation frequency to 1/f noise and, thus, degrade close-in phase noise, but decrease the sensitivity of oscillation frequency to base current shot noise and base resistance thermal noises. The results show that corner offset frequency defined by the intersect of the 1/f/sup 3/ and 1/f/sup 2/ phase noise has little to do with the traditional 1/f corner frequency. The relative importance of individual noise sources in determining phase noise is examined as a function of technology scaling, device sizing, and oscillation frequency. The collector current shot noise and base resistance noise are shown to set the fundamental limits of phase noise reduction. A methodology to identify the maximum tolerable 1/f K factor is established and demonstrated for the HBTs used.

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Available abstract

This paper examines the impact of SiGe HBT scaling on 1/f noise and phase noise of oscillators and frequency synthesizers. The increase of transistor speed with scaling is shown to significantly increase the sensitivity of oscillation frequency to 1/f noise and, thus, degrade close-in phase noise, but decrease the sensitivity of oscillation frequency to base current shot noise and base resistance thermal noises. The results show that corner offset frequency defined by the intersect of the 1/f/sup 3/ and 1/f/sup 2/ phase noise has little to do with the traditional 1/f corner frequency. The relative importance of individual noise sources in determining phase noise is examined as a function of technology scaling, device sizing, and oscillation frequency. The collector current shot noise and base resistance noise are shown to set the fundamental limits of phase noise reduction. A methodology to identify the maximum tolerable 1/f K factor is established and demonstrated for the HBTs used.

Key concepts: Flicker noise, Phase noise, Oscillator phase noise, Noise generator, Noise (video), Shot noise, Noise temperature, Noise spectral density

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